Research on the Influence of Magnetron Sputtering parameters on the Structure and Properties of ITO Thin Films. Advances in Engineering Research : Possibilities and Challenges, [S. l.], v. 3, n. 2, p. 60–74, 2026. DOI: 10.63313/AERpc.9073. Disponível em: https://elibrary.erytis.com/index.php/AERpc/article/view/647. Acesso em: 11 feb. 2026.